Cybernetica CENIT

Cybernetica CENIT

Cybernetica
Semi Process Lab

Semi Process Lab

Quantum Materials
+
+

Related Products

  • Epicor Connected Process Control
    4 Ratings
    Visit Website
  • Pipefy
    594 Ratings
    Visit Website
  • SBS Asset Finance
    3 Ratings
    Visit Website
  • TRACTIAN
    139 Ratings
    Visit Website
  • Interfacing Integrated Management System (IMS)
    66 Ratings
    Visit Website
  • AlisQI
    108 Ratings
    Visit Website
  • Epicor Advanced MES
    31 Ratings
    Visit Website
  • STACK
    1,496 Ratings
    Visit Website
  • EZO AssetSonar
    118 Ratings
    Visit Website
  • LTX
    182 Ratings
    Visit Website

About

Cybernetica delivers Nonlinear Model Predictive Control (NMPC) based on mechanistic models. Our software product, Cybernetica CENIT, offers a flexible architecture that can meet any industrial challenge with optimal solutions. Multivariable optimal control, predictive control, intelligent feed forward, optimal constraint handling. Adaptive control through state and parameter estimation, and feedback from indirect measurements through the process model. Nonlinear models are valid over larger operating ranges. Improved control of nonlinear processes. Less need for step-response experiments and improved state and parameter estimates. Control of batch and semi-batch processes, control of nonlinear processes operated under varying conditions. Optimal grade transition in continuous processes. Safe control of exothermal processes and control of unmeasured variables, such as conversion rates and product quality. Reduced energy consumption and carbon footprint.

About

Semi Process Lab is a browser-based process-prediction workspace for semiconductor and display process engineers and researchers. Its Design · Predict tools model ALD, CVD, PECVD, PVD, RIE and ALE conditions to estimate film growth, thickness, wafer uniformity, step coverage, etch profiles and outcomes. Users can inspect wafer maps and 3D trench, via or stacked-structure views, explore equipment and device designs, and use model recommendations to examine process settings or next experimental recipes. The platform also supports uploading measured equipment data for calibration, offers design templates and AI-assisted image generation, and exports reports or design files in formats including PPTX, Word, Excel and PNG. Free calculators for film uniformity, ALD growth per cycle, etch selectivity and step coverage are also available. It is provided as a web application; prediction outputs are presented as process-design estimates that users should validate on their own equipment.

Platforms Supported

Windows Supported
Mac Not Supported
Linux Not Supported
Cloud Not Supported
On-Premises Not Supported
iPhone Not Supported
iPad Not Supported
Android Not Supported
Chromebook Not Supported

Platforms Supported

Windows Not Supported
Mac Not Supported
Linux Not Supported
Cloud Supported
On-Premises Not Supported
iPhone Not Supported
iPad Not Supported
Android Not Supported
Chromebook Not Supported

Audience

Industrial companies and plants requiring a solution to improve their adaptive control through state and parameter estimation processes

Audience

Semiconductor and display process engineers and researchers working on thin-film deposition (ALD, CVD) and etching

Support

Phone Support Supported
24/7 Live Support Not Supported
Online Supported

Support

Phone Support Not Supported
24/7 Live Support Not Supported
Online Supported

API

Offers API Not Supported

API

Offers API Not Supported

Screenshots and Videos

Screenshots and Videos

Pricing

No information available.
Free Version Not Supported
Free Trial Not Supported

Pricing

Plans use credits. New accounts receive free signup credits; additional credits are available through subscriptions or credit packs.
Free Version Not Supported
Free Trial Not Supported

Reviews/Ratings

Overall 0.0 / 5
ease 0.0 / 5
features 0.0 / 5
design 0.0 / 5
support 0.0 / 5

This software hasn't been reviewed yet. Be the first to provide a review:

Review this Software

Reviews/Ratings

Overall 0.0 / 5
ease 0.0 / 5
features 0.0 / 5
design 0.0 / 5
support 0.0 / 5

This software hasn't been reviewed yet. Be the first to provide a review:

Review this Software

Training

Documentation Supported
Webinars Not Supported
Live Online Not Supported
In Person Supported

Training

Documentation Supported
Webinars Not Supported
Live Online Not Supported
In Person Not Supported

Company Information

Cybernetica
Norway
cybernetica.no/technology/model-predictive-control/

Company Information

Quantum Materials
South Korea
semiprocesslab.com

Alternatives

Aspen DMC3

Aspen DMC3

Aspen Technology

Alternatives

AVEVA APC

AVEVA APC

AVEVA
Digimat

Digimat

e-Xstream engineering
COLUMBO

COLUMBO

PiControl Solutions

Categories

Categories

Materials Science Supported

Integrations

No info available.

Integrations

No info available.
Claim Cybernetica CENIT and update features and information
Claim Cybernetica CENIT and update features and information
Claim Semi Process Lab and update features and information
Claim Semi Process Lab and update features and information